发明名称 METHOD FOR IMPROVING QUALITY OF SPALLED MATERIAL LAYERS
摘要 Methods for removing a material layer from a base substrate utilizing spalling in which mode III stress, i.e., the stress that is perpendicular to the fracture front created in the base substrate, during spalling is reduced. The substantial reduction of the mode III stress during spalling results in a spalling process in which the spalled material has less surface roughness at one of its' edges as compared to prior art spalling processes in which the mode III stress is present and competes with spalling.
申请公布号 US2016163553(A1) 申请公布日期 2016.06.09
申请号 US201615046134 申请日期 2016.02.17
申请人 International Business Machines Corporation ;King Abdulaziz City for Science and Technology 发明人 Bedell Stephen W.;Fogel Keith E.;Lauro Paul A.;Li Ning;Sadana Devendra K.;Saenger Katherine L.;Alhomoudi Ibrahim
分类号 H01L21/304;H01L21/285 主分类号 H01L21/304
代理机构 代理人
主权项 1. A method of removing a material layer from a base substrate, said method comprising: providing a stressor layer with uniaxial stress atop a base substrate having a fracture toughness that is less than that of said stressor layer, wherein said providing said stressor layer with uniaxial stress comprises forming a material having intrinsic uniaxial stress atop said base substrate; and spalling a material layer from said base substrate.
地址 Armonk NY US