| 发明名称 |
APPARATUS FOR TREATING A GAS IN A CONDUIT |
| 摘要 |
Apparatus for treating a gas in a conduit of a substrate processing system are provided. In some embodiments, an apparatus for treating a gas in a conduit of a substrate processing system includes: a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall; and a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube. In some embodiments, the RF coil is hollow and includes coolant fittings to couple the hollow RF coil to a coolant supply. |
| 申请公布号 |
US2016300692(A1) |
申请公布日期 |
2016.10.13 |
| 申请号 |
US201615188504 |
申请日期 |
2016.06.21 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZENG JIBING;WEST BRIAN T.;WANG RONGPING;GAJENDRA MANOJ A. |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for treating a gas in a conduit of a substrate processing system, comprising:
a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall; and a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube. |
| 地址 |
Santa Clara CA US |
