METHOD FOR MANUFACTURING MIRRORS WITH SEMICONDUCTOR SATURABLE ABSORBER

摘要

The invention relates to a method for manufacturing mirrors with saturable semiconducting absorptive material, which includes: depositing a saturable semiconducting absorptive material (205) onto a growth substrate (200) in order to form a structure; depositing at least one metal layer onto the structure such as to form a first mirror (211); and depositing a heat-conductive substrate (212) onto the metal layer by electrodeposition through an electrically insulating mask (312), allowing the selective deposition of the thermally conductive substrate, in order to predefine the perimeter of the mirrors with saturable semiconducting absorptive material.

主权项

1. A method for manufacturing mirrors with semiconductor saturable absorber comprising:
the deposition onto a substrate for growth of a semiconductor saturable absorptive material so as to form a structure; the deposition of at least one metal layer onto the structure in order to form a first mirror; the deposition by electro-deposition through an electrically-insulating mask of a thermally-conductive substrate onto the metal layer, allowing the selective deposition of the thermally-conductive substrate, in order to predefine the perimeter of the mirrors with semiconductor saturable absorber.