发明名称 |
Automatic Defect Classification Without Sampling and Feature Selection |
摘要 |
Systems and methods for defection classification in a semiconductor process are provided. The system includes a communication line configured to receive a defect image of a wafer from the semiconductor process and a deep-architecture neural network in electronic communication with the communication line. The neural network has a first convolution layer of neurons configured to convolve pixels from the defect image with a filter to generate a first feature map. The neural network also includes a first subsampling layer configured to reduce the size and variation of the first feature map. A classifier is provided for determining a defect classification based on the feature map. The system may include more than one convolution layers and/or subsampling layers. A method includes extracting one or more features from a defect image using a deep-architecture neural network, for example a convolutional neural network. |
申请公布号 |
US2016163035(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
US201514956326 |
申请日期 |
2015.12.01 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
Chang Wei;Olavarria Ramon;Rao Krishna |
分类号 |
G06T7/00;G06K9/62;G06K9/66 |
主分类号 |
G06T7/00 |
代理机构 |
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代理人 |
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主权项 |
1. A system for defect classification in a semiconductor process, comprising:
a communication line configured to receive a defect image of a wafer from the semiconductor process; a deep architecture neural network in electronic communication with the communication line, comprising:
a first convolution layer of neurons, each neuron configured to convolve a corresponding receptive field of pixels from the defect image with a filter to generate a first feature map;a first subsampling layer configured to reduce the size and variation of the first feature map; anda classifier for determining a defect classification based on the feature map. |
地址 |
Milpitas CA US |