发明名称 |
OXIDE SEMICONDUCTOR DEVICES, METHODS OF FORMING OXIDE SEMICONDUCTOR DEVICES AND ORGANIC LIGHT EMITTING DISPLAY DEVICES INCLUDING OXIDE SEMICONDUCTOR DEVICES |
摘要 |
An oxide semiconductor device includes a first insulation layer pattern and a second insulation layer pattern disposed on a substrate, an active layer disposed on the first and second insulation layer patterns, the active layer including a source region including the first insulation layer pattern, a drain region including the second insulation layer pattern, and a channel region disposed between the source and drain regions, a source electrode contacting the source region, and a drain electrode contacting the drain region. |
申请公布号 |
US2016254334(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201514817900 |
申请日期 |
2015.08.04 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
YANG Shin-Hyuk;KIM Tae-Young;PARK Hye-Hyang |
分类号 |
H01L27/32;H01L29/66;H01L21/4757;H01L29/423;H01L21/477;H01L29/786;H01L29/24 |
主分类号 |
H01L27/32 |
代理机构 |
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代理人 |
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主权项 |
1. An oxide semiconductor device, comprising:
a substrate; a first insulation layer pattern and a second insulation layer pattern disposed on the substrate; an active layer disposed on the first insulation pattern and the second insulation layer pattern, the active layer comprising a source region comprising the first insulation layer pattern, a drain region comprising the second insulation layer pattern, and a channel region disposed between the source region and the drain region; a source electrode contacting the source region; and a drain electrode contacting the drain region. |
地址 |
Yongin-city KR |