发明名称 OXIDE SEMICONDUCTOR DEVICES, METHODS OF FORMING OXIDE SEMICONDUCTOR DEVICES AND ORGANIC LIGHT EMITTING DISPLAY DEVICES INCLUDING OXIDE SEMICONDUCTOR DEVICES
摘要 An oxide semiconductor device includes a first insulation layer pattern and a second insulation layer pattern disposed on a substrate, an active layer disposed on the first and second insulation layer patterns, the active layer including a source region including the first insulation layer pattern, a drain region including the second insulation layer pattern, and a channel region disposed between the source and drain regions, a source electrode contacting the source region, and a drain electrode contacting the drain region.
申请公布号 US2016254334(A1) 申请公布日期 2016.09.01
申请号 US201514817900 申请日期 2015.08.04
申请人 Samsung Display Co., Ltd. 发明人 YANG Shin-Hyuk;KIM Tae-Young;PARK Hye-Hyang
分类号 H01L27/32;H01L29/66;H01L21/4757;H01L29/423;H01L21/477;H01L29/786;H01L29/24 主分类号 H01L27/32
代理机构 代理人
主权项 1. An oxide semiconductor device, comprising: a substrate; a first insulation layer pattern and a second insulation layer pattern disposed on the substrate; an active layer disposed on the first insulation pattern and the second insulation layer pattern, the active layer comprising a source region comprising the first insulation layer pattern, a drain region comprising the second insulation layer pattern, and a channel region disposed between the source region and the drain region; a source electrode contacting the source region; and a drain electrode contacting the drain region.
地址 Yongin-city KR