发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR STORAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor storage device that can reduce the power consumption of a memory cell when forming a CAM including a nonvolatile storage device, a semiconductor storage device that can suppress the deterioration in repeating data writing, and a nonvolatile storage device that can increase the density of the memory cell.SOLUTION: A semiconductor storage device includes: a first transistor including an oxide semiconductor in a semiconductor layer; a memory circuit including a capacitor that can hold a potential corresponding to written data by turning off the first transistor; and a reference circuit used to refer to the written potential. By detecting the conductive state of a second transistor included in the reference circuit, the address of the matching data is acquired to enable a high-speed searching function.SELECTED DRAWING: Figure 1
申请公布号 JP2016184749(A) 申请公布日期 2016.10.20
申请号 JP20160097751 申请日期 2016.05.16
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TAKAHASHI YASUYUKI
分类号 H01L21/8242;G11C11/405;G11C15/04;H01L21/477;H01L27/108;H01L29/786 主分类号 H01L21/8242
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