发明名称 COLOR FILTER SUBSTRATE INCLUDING PHOTOSPACER
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem that when a photospacer is formed on a color filter substrate by using a resist material, a recess is generated at a top part of the photospacer, a polyimide resin resident in the recess in a post-process remains as a coated film and is diffused in a liquid crystal after a panel is assembled. <P>SOLUTION: In the color filter substrate including at least a black matrix 2, a color filter and the photospacer 30 on a transparent substrate 1, the black matrix 2 is laid in a lower part of a colored pixel 20 which constitutes the color filter to swell a part of the colored pixel in a trapezoidal shape, the photospacer 30 is formed at the part of the trapezoidal shape, and the lower edge part 31 of the photospacer is formed on and/or over a side slope of a trapezoidal swelling part. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010019879(A) 申请公布日期 2010.01.28
申请号 JP20080177620 申请日期 2008.07.08
申请人 TOPPAN PRINTING CO LTD 发明人 MATSUSEI KENJI;YASUHARA TOSHIJI
分类号 G02F1/1339;G02F1/1335 主分类号 G02F1/1339
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