发明名称 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 To provide an exposure apparatus that allows an understanding of the condition of the apparatus and that can prevent a leakage or scattering of a liquid. The exposure apparatus (EX) includes a display apparatus (D) that indicates at least one of a status of filling of an optical path space (K1) of the exposure light (EL) with the liquid (LQ) and a status of recovering of the liquid (LQ) from the optical path space (K1).
申请公布号 IL183628(D0) 申请公布日期 2007.09.20
申请号 IL20070183628 申请日期 2007.06.03
申请人 NIKON CORPORATION;CHIAKI NAKAGAWA 发明人
分类号 H01L 主分类号 H01L
代理机构 代理人
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