| 摘要 |
<p>A partially-exposing apparatus and a method for repairing defect of a photomask using the same are provided to perform a correcting process after confirming a defect site and exposing a defect portion in order to minimize line width error effect of a pattern generated in a correcting process of a fault part. A partially-exposing apparatus comprises: a stage(100) in which a photomask(M) is arranged; an operation computer(110) controlling a repair process of defect generated in the photomask; an image recording device(120) measuring a defect image generated on the photomask; image processor(130) designating the domain which would be modified by using the image signal measured from the image recording device; a laser(140) for exposure transmitting laser beam on the photomask; an aperture(170) controlling the size of laser beam transmitted from the laser for exposure; and an illumination(190) for a laser marker confirming domain in which the laser beam is exposed on the photomask from the laser for exposure.</p> |
