发明名称 |
MASK PATTERN AND METHOD FOR FORMING THE SAME |
摘要 |
The invention provides a mask pattern. The mask pattern comprises at least a continuous pattern. Each of the continuous patterns has a first pattern, a second pattern and a set of assistance patterns. The assistant patterns are located between the first pattern to the second pattern. The first pattern, the assistant patterns and the second pattern together form a closed opening.
|
申请公布号 |
US2008220341(A1) |
申请公布日期 |
2008.09.11 |
申请号 |
US20070683778 |
申请日期 |
2007.03.08 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
FU CHUAN-HSIEN;YANG CHUEN-HUEI;KUO CHIEN-LI;WANG SHU-RU;WANG YU-LIN |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|