Lenticular wafer inspection

摘要

A system and method for inspecting a surface, comprising: illuminating said surface with an electromagnetic radiation to generate scattered radiation from features of said surface; inducing a change in phase to said scattered radiation for reducing divergence of said scattered radiation and for redirecting said scattered radiation towards a predetermined spatial region; focusing after said radiation has propagated to said spatial region; capturing an image of radiation, whereby said features of said surface are detected in said image of radiation.

主权项

1. A system for inspecting a surface, comprising:
an electromagnetic radiation incident on said surface to generate scattered radiation from features of said surface; a quadratic phase micro-optic layer disposed to reduce the divergence of said scattered radiation by inducing a plurality of substantially quadratic phase shifts; a linear phase micro-optic layer disposed to redirect said scattered radiation towards a predetermined spatial region by inducing a plurality of substantially linear phase shifts; an imaging optic located in said spatial region to focus said radiation from said micro-optic layer; and an image sensor positioned to detect radiation from said imaging optic to generate an image of radiation, whereby said features of said surface are detected in said image of radiation.