Integrated induction coil and microwave antenna as an all-planar source

摘要

This disclosure relates to a plasma processing system that can use a single power source assembly to generate inductively coupled plasma (ICP) and surface wave plasma using the same physical hardware. The power source assembly may include an antenna plate that may include a conductive material be used an ICP coil for a radio frequency (RF) power source and as a slot antenna for a microwave source.

主权项

1. A plasma processing device for a substrate, comprising:
a plasma processing chamber; a substrate holder disposed in the plasma processing chamber and configured to receive the substrate; a microwave power supply configured to generate microwave energy; a radio frequency (RF) power supply configured to generate RF energy; and a slot antenna comprising:
(i) a first dielectric component formed in a first slot opening of the slot antenna, the first dielectric component coupled to the microwave power supply and configured to transmit the microwave energy,(ii) a second dielectric component formed in a second slot opening of the slot antenna, and(iii) a metal layer disposed between the first dielectric component and the second dielectric component and wherein the metal layer is coupled to the radio frequency power supply so that the radio frequency power supply supplies radio frequency power to the metal layer; wherein the metal layer comprises a pattern that enables the transmission of the microwave energy from the first dielectric component to the second dielectric component, and wherein the pattern comprises a continuous low impedance path starting proximate to the edge of the slot antenna and ending proximate to a center region of the slot antenna and the first slot and the second slot form contours along the low impedance path starting proximate to the edge of the slot antenna and ending proximate to a center region of the slot antenna.