| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizing device monitoring a vaporized state and contributing to the stability of film deposition. SOLUTION: The vaporizing device is provided with: a vaporizer 10 and a particle size measuring apparatus 20. The vaporizer 10 vaporizes the fine particles of a sprayed liquid material, and sends out a material gas P produced by the vaporization to a particle size measuring apparatus 20 through piping 3. The particle size measuring apparatus 20 irradiates laser light L1 from a semiconductor laser light source 21 to the material gas P in a flow cell 23, and detects diffracted-scattered light L3 produced by the material gas P as an optical intensity distribution pattern by an optical sensor 25. The detected data are treated in a control part 26. The particle size measuring apparatus 20 can be provided on the vaporizer 10, the piping 3 and 4 or a CVD film deposition system body 5. COPYRIGHT: (C)2005,JPO&NCIPI
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