发明名称 PROCESS AND STRUCTURE FOR FABRICATION OF MEMS DEVICE HAVING ISOLATED EGDE POSTS
摘要 <p>A method of fabricating an array of MEMS devices includes the formation of support structures (98) located at the edge of upper strip electrodes (92). A support structure is etched to form a pair of individual support structures located at the edges of a pair of adjacent electrodes (92). The electrodes themselves may be used as a hard mask during the etching of these support structures. A resultant array of MEMS devices includes support structures having a face (107) located at the edge of an overlying electrode and coincident with the edge of the overlying electrode.</p>
申请公布号 WO2007142737(A1) 申请公布日期 2007.12.13
申请号 WO2007US08907 申请日期 2007.04.09
申请人 QUALCOMM INCORPORATED;HEALD, DAVID 发明人 HEALD, DAVID
分类号 G02B26/00 主分类号 G02B26/00
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