| 摘要 |
<p>A photosensitive resin composition for forming the overcoating layer of a color filter, a method for forming a color filter by using the composition, a color filter formed by the method, and a CMOS image sensor using the color filter are provided to allow the line width and height of each pattern to be controlled easily and to improve transparency. A photosensitive resin composition comprises a UV absorber. Preferably the UV absorber is a benzotriazole-based compound, a benzophenone-based compound, a triazine derivative, an oxalic anilide-based compound, a pyrimidine-based compound, or a salicylic acid derivative. Preferably the composition comprises 5-50 wt% of a resin; 5-30 wt% of a crosslinking monomer; 0.5-5 wt% of a photopolymerization initiator; 0.1-5 wt% of a UV absorber; and the balance of a solvent.</p> |
