发明名称 METHOD FOR PRODUCING OXIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing an oxide single crystal for efficiently producing an oxide single crystal with excellent quality while sufficiently decreasing impurities included in the source material. SOLUTION: The method includes: a melting step of heating a source material used for producing an oxide single crystal to obtain a melt 18; an impurity removing step of retaining the melt state to decrease impurities included in the melt; and a single crystal growing step of producing an oxide single crystal 1 from the melt 18 of the source material after the impurity removing step. In the impurity removing step, the melt state is retained in a reduced pressure atmosphere of from 1.0×10<SP>-4</SP>to 1.0 Pa, or in an inert gas atmosphere containing at least one kind of gas selected from a group consisting of Ar, Ne, Kr and N<SB>2</SB>, or in the inert gas atmosphere with oxygen mixed by 0.01 to 20 vol%, and the retention time is specified to 1 to 1,000 hours. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009132594(A) 申请公布日期 2009.06.18
申请号 JP20080119786 申请日期 2008.05.01
申请人 HITACHI CHEM CO LTD 发明人 HIRASAKI TETSURO;KURASHIGE KAZUHISA;UEDA SHUNSUKE
分类号 C30B29/16;C30B15/00 主分类号 C30B29/16
代理机构 代理人
主权项
地址