| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam drawing device that corrects the height of a sample with high precision. SOLUTION: The electron beam drawing device includes an electron gun which emits an electron beam, a holder which holds a sample to be drawn where a pattern is drawn with the electron beam, and a control section which corrects a drawing position according to the height of the sample. The control section converts an orthonormal function system approximating a surface of the sample by linear combination into a new orthonormal function system by the Gram-Schmidt process by using an internal product defined by expression 1, and then defines, as an approximate curved surface of the sample, linear combination of a function group based on, as coefficients, projections calculated for each of functions of the new orthonormal function system. Here, Fn and Fm are functions of the orthonormal function system, (i) and (N) are integers, and (xi, yi) is a sampling position for measurement on a sample surface. COPYRIGHT: (C)2010,JPO&INPIT
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