| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a high-purity thick film containing a metal element, and comprising an oxide, a nitride, a carbide or a sulfide, efficiently on the surface of a substrate.SOLUTION: In a film formation method, mist 18 charged positively or negatively is generated by using a raw material solution in which a component derived from a metal element is dissolved in an atmosphere containing gas comprising molecules containing at least one kind selected from an oxygen element, a nitrogen element, a carbon element and elemental sulfur, and the charged mist 18 is supplied continuously to a substrate 20, and the charged mist staying on the surface of the substrate 20 or its periphery is irradiated with a laser beam having a wavelength of 500 nm-11 μm.SELECTED DRAWING: Figure 1 |
