发明名称 ELECTRON GUN FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide an electron gun for vapor deposition in which vapor-deposited particles generated from a vapor deposition material irradiated with electron beam is prevented from being deposited on a pole piece for deflecting the electron beam arranged on the electron gun. SOLUTION: A permanent magnet 14, a filament 16 for emitting thermoelectron, a scan coil unit 17 for scanning the electron beam on a vapor deposition material in the directions of X-axis and Y-axis and the like are arranged in a body case 20 made of a non-magnetic material and formed in a box shape. A pair of pole pieces 11a, 11b opposite to each other for forming the magnetic field for deflecting the electron beam, and a pair of pole pieces 12a, 12b opposite to each other for forming the magnetic field for adjusting the orbit of the electron beam are horizontally provided in the body case 20. An upper cover 21 made of a non-magnetic material and having a square opening 22 for emitting the electron beam is mounted on an upper part of the body case 20. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010018826(A) 申请公布日期 2010.01.28
申请号 JP20080178704 申请日期 2008.07.09
申请人 NISSHIN GIKEN KK 发明人 SUGITA KAORU;TAZAKI JUN;WAKATA HIROAKI
分类号 C23C14/30 主分类号 C23C14/30
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