| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device which can create exposing data quickly and easily, and an exposing method of an electronic beam. SOLUTION: An electronic beam exposing process comprises an exposing data creating step of creating the exposing data, an electronic beam shaping step of shaping an electronic beam based on the exposing data created in the exposing data creating step with a block mask, and an irradiating step of irradiating a target object with the electronic beam shaped in the electronic beam shaping step based on the exposing data created in the exposing data creating step. The exposing data creating process has a library creating step of creating a library in which data defining an exposure pattern are stored in a hierarchical structure; an exposure pattern creating step of creating the exposure pattern based on the data stored in the library created in the library creating step; and an exposing data creating step of creating the exposing data based on the exposure pattern created in the exposure pattern creating step. COPYRIGHT: (C)2007,JPO&INPIT
|
