发明名称 GRAPHENE BASED MAGNETORESISTANCE SENSORS
摘要 A graphene structure is provided. The graphene structure comprises a substrate layer and at least two graphene layers disposed on the substrate. The at least two graphene layers comprises a gate voltage tuned layer and an effective graphene layer and the effective graphene layer comprises one or more graphene layers. A magnetoresistance ratio of the graphene structure is determined by a difference in a charge mobility and/or a carrier density between the gate voltage tuned layer and the effective graphene layer. The charge mobility and/or the carrier density of the gate no voltage tuned layer is tunable by a gate voltage applied to the graphene structure. A magnetic field sensor comprising the graphene structure is also provided.
申请公布号 SG11201605221U(A) 申请公布日期 2016.07.28
申请号 SG11201605221U 申请日期 2014.12.26
申请人 NATIONAL UNIVERSITY OF SINGAPORE 发明人 KALON, GOPINADHAN;YANG, HYUNSOO;SHIN, YOUNG JUN;CASTRO NETO, ANTONIO HELIO
分类号 G01R33/09;B82Y25/00 主分类号 G01R33/09
代理机构 代理人
主权项
地址
您可能感兴趣的专利