VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD

摘要

A vapor deposition device (1) is provided with: a vapor deposition source (30); a vapor deposition mask (10) having a plurality of mask openings (12); and a limiting plate unit (20) having a plurality of limiting plates (22). In a cross section of the limiting plate unit taken parallel to the X-axis direction, limiting plate openings (23) between the limiting plates face film formation regions (202) on a film formation substrate (200) in one-to-one correspondence and prevent vapor deposition particles (310) with an incident angle less than a shadow critical angle from entering the mask openings.