| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a small plasma device with high treatment efficiency. <P>SOLUTION: The plasma device 1 includes a first treating part 2 and a second treating part 3. The first treating part 2, and the second treating part 3 include drums 21, 31 for winding a work 8 of which a treated surface 81 is arranged on an outer circumference, electrodes 24, 34, high frequency power sources 71, 72 for applying a voltage between the electrodes 24, 34, and the drums 21, 31, gas supplying means 51, 52 for supplying gas between the electrodes 24, 34, and the drums 21, 31. The gas is activated to generate plasma by applying a voltage between the electrodes 24, 34 and the drums 21, 31 while supplying the gas between the electrodes 24, 34 and the drums 21, 31, and the treated surface 81 of the work 8 is treated by the plasma. The work 8 treated by the first treating part 2 is supplied to the second treating part 3 and is treated. <P>COPYRIGHT: (C)2008,JPO&INPIT |
