ASYMMETRIC TEMPLATE SHAPE MODULATION FOR PARTIAL FIELD IMPRINTING
摘要
Systems and methods for partial field imprinting are provided such that imprint templates are asymmetrically modulated to allow initial contact with a partial field on a substrate at a location spaced apart from the template center.
申请公布号
SG11201604407W(A)
申请公布日期
2016.07.28
申请号
SG11201604407W
申请日期
2014.12.31
申请人
CANON NANOTECHNOLOGIES, INC.
发明人
GANAPATHISUBRAMANIAN, MAHADEVAN;KINCAID, MATTHEW M.;CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V.
