| 发明名称 | Method for testing susceptor of chemical vapor deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same | ||
| 摘要 | A method for testing a susceptor of a chemical vapor deposition (CVD) apparatus includes preparing a substrate including a transparent conductive layer, disposing the substrate with the transparent conductive layer on the susceptor of the CVD apparatus, and determining whether or not the susceptor of the CVD apparatus is normal by measuring a surface resistance across the transparent conductive layer. | ||
| 申请公布号 | US9508613(B2) | 申请公布日期 | 2016.11.29 |
| 申请号 | US201414149576 | 申请日期 | 2014.01.07 |
| 申请人 | Samsung Display Co., Ltd. | 发明人 | Yang Jin-Woo |
| 分类号 | G01R31/26;H01L21/66;C23C16/458;C23C16/52;H01L51/00;H01L51/56 | 主分类号 | G01R31/26 |
| 代理机构 | Lewis Roca Rothgerber Christie LLP | 代理人 | Lewis Roca Rothgerber Christie LLP |
| 主权项 | 1. A method for testing a susceptor of a chemical vapor deposition (CVD) apparatus, the method comprising: preparing a substrate comprising a transparent conductive layer; disposing the substrate with the transparent conductive layer on the susceptor of the CVD apparatus and annealing the transparent conductive layer; and determining a temperature of the susceptor of the CVD apparatus by measuring a surface resistance across the annealed transparent conductive layer. | ||
| 地址 | Yongin-si KR | ||