| 摘要 |
PROBLEM TO BE SOLVED: To provide a formation method of an organic semiconductor layer having a uniform thickness.SOLUTION: A formation method of an organic semiconductor layer comprises: a base material supply process of supplying a base material 22; an atmosphere control process of controlling ambient atmosphere; and a discharge process of discharging droplets 24d of a coating liquid 24 containing an organic semiconductor material and a solvent. In the atmosphere control process, a control gas for inhibiting evaporation of the solvent contained in the droplets 24d is supplied to around a discharge device 15. |
