发明名称 CHARGED PARTICLE BEAM DRAWING DEVICE AND CHARGED PARTICLE BEAM DRAWING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a drawing device which allows for proximity effect correction while taking account of influence of both patterns when drawing patterns under different drawing conditions.SOLUTION: A charged particle beam drawing device includes: a block generation unit for generating a plurality of area processing blocks in a drawing region where a plurality of drawing groups of different reference exposure dose is to be drawn; a block generation unit for generating a plurality of proximity effect correction processing blocks for correcting proximity effect for each drawing group region; an area density calculation unit for calculating area density of a figure pattern arranged for each area processing block; a weighting operation unit for weighting the area density by using the reference exposure dose of a corresponding drawing group region for each area processing block; and a proximity effect correction irradiation coefficient calculation unit for calculating the proximity effect correction irradiation coefficients by using the area density thus weighted for each proximity effect correction processing block.SELECTED DRAWING: Figure 1
申请公布号 JP2016219829(A) 申请公布日期 2016.12.22
申请号 JP20160153634 申请日期 2016.08.04
申请人 NUFLARE TECHNOLOGY INC 发明人 KATO YASUO;YASHIMA JUN;ANPO AKIHITO
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
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