发明名称 |
CHARGED PARTICLE BEAM DRAWING DEVICE AND CHARGED PARTICLE BEAM DRAWING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a drawing device which allows for proximity effect correction while taking account of influence of both patterns when drawing patterns under different drawing conditions.SOLUTION: A charged particle beam drawing device includes: a block generation unit for generating a plurality of area processing blocks in a drawing region where a plurality of drawing groups of different reference exposure dose is to be drawn; a block generation unit for generating a plurality of proximity effect correction processing blocks for correcting proximity effect for each drawing group region; an area density calculation unit for calculating area density of a figure pattern arranged for each area processing block; a weighting operation unit for weighting the area density by using the reference exposure dose of a corresponding drawing group region for each area processing block; and a proximity effect correction irradiation coefficient calculation unit for calculating the proximity effect correction irradiation coefficients by using the area density thus weighted for each proximity effect correction processing block.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016219829(A) |
申请公布日期 |
2016.12.22 |
申请号 |
JP20160153634 |
申请日期 |
2016.08.04 |
申请人 |
NUFLARE TECHNOLOGY INC |
发明人 |
KATO YASUO;YASHIMA JUN;ANPO AKIHITO |
分类号 |
H01L21/027;G03F7/20;H01J37/305 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|