SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning device which prevents a surface of a substrate from being contaminated by foreign objects.SOLUTION: A substrate cleaning device 10 includes: a stage 12 which supports a wafer W from the back side; a cover 13 which covers a surface of the supported wafer W and maintains a gap G in between itself and the surface of the wafer W; and a gas cluster shower 15 which radiates gas cluster 25 toward a bevel part 14 on the back side of the supported wafer W. The cover 13 has a downflow gas jet port 19 which opens to the gap G in a position facing a center part of the wafer W.SELECTED DRAWING: Figure 1