COMPOSITIONS COMPRISING BLOCK COPOLYMER AND PROCESSES FOR PHOTOLITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide new photoresist compositions that are useful for immersion lithography.SOLUTION: Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.SELECTED DRAWING: None