PROJECTION LENS WITH WAVE FRONT MANIPULATOR, AND PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS

摘要

A projection lens (PO) for imaging a pattern of a mask arranged in the region of an object plane (OS) of the projection lens into an image plane (IS) of the projection lens by means of electromagnetic radiation with a work wavelength λ < 260 nm has a multiplicity of optical elements with optical surfaces, which are arranged in a projection beam path between the object plane (OS) and the image plane (IS) in such a way that a pattern arranged in the object plane is imageable into the image plane by means of the optical elements. Furthermore, provision is made of a wavefront manipulation system (WFM) for controllable influencing of the wavefront of the projection radiation travelling from the object plane to the image plane. The wavefront manipulation system has a manipulator (MAN) which has a manipulator element (ME) arranged in the projection beam path and an actuating device (DR) for reversibly changing an optical effect of the manipulator element on radiation of the projection beam path. A manipulator surface of the manipulator element is arranged at a finite distance (D) from a closest field plane of the projection lens in the optical vicinity of this field plane in such a way that locally different optical effects of the manipulator element are adjustable by means of the actuating device for beams emanating from different field points of the field plane. Furthermore, provision is made of a sensitivity adaptation system for adapting asensitivity of the manipulator to changes of imaging properties, wherein these changes may be caused by displacing the mask in relation to the object plane and/or by deforming the mask.