发明名称 熱硬化性樹脂組成物、半導体デバイス用部材、及びそれを用いた半導体デバイス
摘要 PROBLEM TO BE SOLVED: To provide a member for a semiconductor device in which there is no generation of a crack and a release at a long period of time of use, and which is excellent in gas barrier property and adhesion.SOLUTION: A thermosetting resin composition contains (A) a polysiloxane having an epoxy equivalent of 800 to 2,000 g/eq. and represented by formula (1): (RRRSiO)(RRSiO)(RSiO)(SiO)(OR), (B) an epoxy compound, (C) a curing agent, and (D) a curing catalyst, wherein the total of the epoxy equivalent of (A) the polysiloxane and (B) the epoxy compound contained in the thermosetting resin composition is 600 to 1,500 g/eq.; and the storage elastic modulus at 150°C of a cured material formed by a thermal treatment of the thermosetting resin composition as measured by a dynamic viscoelasticity measurement is 5.00×10to 1.50×10Pa.
申请公布号 JP6031739(B2) 申请公布日期 2016.11.24
申请号 JP20110196086 申请日期 2011.09.08
申请人 三菱化学株式会社 发明人 田中 俊行;安藤 正人;渡部 拓海;上野 信彦
分类号 C08G59/20;H01L23/29;H01L23/31 主分类号 C08G59/20
代理机构 代理人
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