METHOD FOR FORMING NEGATIVE RESIST PATTERN AND COMPOSITION FOR FORMING OVERLAY FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a negative resist pattern and a composition for forming an overlay film, by which water repellency on a surface of an overlay film can be increased and a resist pattern with fewer development defects can be formed.SOLUTION: The method for forming a negative resist pattern includes steps of: forming a resist film; forming an overlay film from a composition for forming an overlay film on one surface of the resist film; subjecting the resist film with the overlay film formed to immersion exposure; and developing the resist film subjected to the immersion exposure by use of a developer containing an organic solvent. The composition for forming an overlay film comprises: a polymer component comprising a first polymer having a first structural unit containing an alicyclic structure and a second structural unit containing a fluorine atom except for the first structural unit; and a solvent. The content percentage of fluorine atoms in the polymer component is 2 mass% or more and 30 mass% or less.SELECTED DRAWING: None