发明名称 |
MAGNETIC RECORDING FILM FORMATION SPUTTERING TARGET, AND CARBON MATERIAL USED FOR PRODUCING TARGET |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-density sputtering target that allows a granular structure magnetic thin film to be fabricated without using an expensive simultaneous sputtering apparatus, and that further reduces an amount of particles generated in sputtering.SOLUTION: There is provided a magnetic recording film formation sputtering target which is formed by moulding and sintering raw material powder containing carbon powder that contains fluorine in amount of 50 wtppm or more and that has a median size of 0.1-20 μm, and which is further subjected to isotropic hot treatment.SELECTED DRAWING: None |
申请公布号 |
JP2016173871(A) |
申请公布日期 |
2016.09.29 |
申请号 |
JP20160033966 |
申请日期 |
2016.02.25 |
申请人 |
JX NIPPON MINING & METALS CORP |
发明人 |
OGINO SHINICHI;NAKAMURA YUICHIRO |
分类号 |
G11B5/851;C01B31/02;C23C14/34;G11B5/65 |
主分类号 |
G11B5/851 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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