发明名称 |
Multi-Gate High Voltage Device |
摘要 |
A high voltage semiconductor device, particularly a device including a number of high breakdown voltage transistors having a common drain, first well, and insulating structure between the gate and the drain as well as method for using the same is provided in this disclosure. The high breakdown voltage transistors in the device together are in an elliptical shape. A second well region, gate structure, and a source region are partially overlapping discontinuous elliptical rings having at least two discontinuities or openings in a top view. The respective discontinuities or openings define each of the high breakdown voltage transistors. |
申请公布号 |
US2016315079(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615201249 |
申请日期 |
2016.07.01 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lee Jam-Wem |
分类号 |
H01L27/088;H01L29/78;H01L29/10;H01L29/06 |
主分类号 |
H01L27/088 |
代理机构 |
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代理人 |
|
主权项 |
1. A high voltage semiconductor device, comprising:
a plurality of high breakdown voltage transistors having a common drain region, a first doped well, and a first insulating structure, wherein each of the plurality of high breakdown voltage transistors extends along a common angular periphery in a top view and the plurality of high breakdown voltage transistors together has a circular shape. |
地址 |
Hsin-Chu TW |