Pattern Measurement Device and Computer Program

摘要

The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.

主权项

1. A pattern measurement device comprising:
a computation device that measures a measurement target pattern by using a waveform signal obtained by scanning a pattern with a charged particle beam, wherein the computation device classifies pattern sites which are repeatedly arrayed at a specific interval, in accordance with positions of the pattern sites, on the basis of the waveform signal, and executes a pattern edge type identification, a pattern type identification, or measurement of dimensions between predetermined pattern sites, on the basis of association between the classified pattern site, and information pertaining to a pattern edge type, or information pertaining to a pattern type.