| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a power source for an electrode of DAP, and to achieve a highly integrated deflector array by employing a simple method. <P>SOLUTION: A multi-beam pattern definition device 300 for use in a particle-beam processing or inspection apparatus is configured to irradiate a beam of electrically charged particles, allow passage of the beam through a plurality of apertures, and then form beamlets which are imaged onto a target. The multi-beam pattern definition device 300 includes a deflection array means 302 and a plurality of electrostatic deflector electrodes 321 for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes 311 are electrically connected to a counter potential independently of the deflection array means through a counter-electrode array means 301. The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode 311, each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode. <P>COPYRIGHT: (C)2009,JPO&INPIT |
