发明名称 CROSS-MOUNTED MASK CHANGER WITH THICKNESS MONITORING
摘要 A single substrate is exposed in a single pumpdown to vapor deposition from a plurality of evaporation sources. A photo processed mask for each source is mounted on a linearly movable carriage, moving the masks sequentially beneath the substrate for contact with it. The carriage, the substrate holder assembly, a shutter for selecting vapor sources, as well as the sources themselves are all mounted and contained within a Pyrex cross, sealed at each of its ports to sustain a vacuum.
申请公布号 US3747558(A) 申请公布日期 1973.07.24
申请号 USD3747558 申请日期 1972.11.03
申请人 AIR FORCE,US 发明人 HAREL A,IL
分类号 C23C14/04;C23C14/54;(IPC1-7):C23C13/08 主分类号 C23C14/04
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