| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology that is advantageous for achieving both throughput and precision improvement in the correction of exposure light quantity unevenness.SOLUTION: Provided is an illumination optical system for illuminating a surface to be illuminated with light from a light source. A light shielding plate is provided between the light source and the surface to be illuminated in the illumination optical system. The light shielding plate forms a shape of at least a portion of an opening defining the shape of an illumination area on the surface to be illuminated, in an arc. Also, the illumination optical system has a plurality of adjustment units for applying a force to multiple locations of the light shielding plate in the normal direction of the arc in order to adjust the shape of the opening. A first adjustment unit out of the plurality of adjustment units has a relief mechanism that allows a displacement in a direction different from the normal direction when a second adjustment unit applies a force in the normal direction.SELECTED DRAWING: Figure 2 |
