Method of fabricating semiconductor cleaners

摘要

A method of fabricating a cleaning solvent for removing a residue, the method comprising: compiling a database that includes solvents and a set of solvent solubility parameters for a large plurality of perspective solvents; selecting from the large plurality of perspective solvents a small plurality of test solvents; measuring an amount of the residue dissolved by each member of the small plurality of test solvents; calculating a set of solute solubility parameters for the residue by combining solvent solubility parameters of the small plurality of test solvents in proportion to an amount of residue dissolved by each member of the small plurality of test solvents; and mixing at least two solvents from the large plurality of perspective solvents to form a mixture so that a set of solvent solubility parameters for the mixture approximates the set of solute solubility parameters for the residue.

主权项

1. A method of fabricating a cleaning solvent for removing a residue, the method comprising:
compiling a database that includes solvents and a set of solvent solubility parameters for a large plurality of perspective solvents; selecting from the large plurality of perspective solvents a small plurality of test solvents; measuring an amount of the residue dissolved by each member of the small plurality of test solvents; calculating a set of solute solubility parameters for the residue by combining solvent solubility parameters of the small plurality of test solvents in proportion to an amount of residue dissolved by each member of the small plurality of test solvents; and mixing at least two solvents from the large plurality of perspective solvents to form a mixture so that a set of solvent solubility parameters for the mixture approximates the set of solute solubility parameters for the residue.