发明名称 SEMICONDUCTOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a silicon carbide semiconductor substrate capable of improving the yield of a semiconductor device.SOLUTION: A semiconductor substrate 10 has a main surface 1 and consists of a single crystal silicon carbide. The main surface 1 includes a central region 3 except a region within 5 mm from the outer periphery 2. When the central region 3 is divided into square regions 4 having a one side of 1 mm, a dislocation density having a Burgers vector parallel to a<0001>direction is 1×10cmor less even in any of the square regions 4.SELECTED DRAWING: Figure 1
申请公布号 JP2016169156(A) 申请公布日期 2016.09.23
申请号 JP20160131835 申请日期 2016.07.01
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NISHIGUCHI TARO;HARADA MAKOTO;FUJIWARA SHINSUKE
分类号 C30B29/36 主分类号 C30B29/36
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