发明名称 METHODS OF TREATING EPOXY SURFACES
摘要 <p>1384113 Treating epoxy coatings WESTERN ELECTRIC CO INC 1 Feb 1972 [11 Aug 1971 20 Aug 1971] 4707/72 Heading B2E [Also in Divisions C3 and C7] A surface comprising a cured composition comprising bis-phenol A-epichlorohydrin epoxy is treated to improve the adherence of materials by (1) exposing the surface to a swellant so as to swell the surface, the swellant being selected from methyl ethyl ketone, tetrahydrofuran, dioxane, pyridine, dimethylformamide, a mixture of a) methyl ethyl ketone b) methanol and c) ethanol or a mixture thereof and (2) exposing the swelled surface to an etchant comprising H 2 SO 4 or Cr VI ions or H 3 PO 4 or a mixture thereof so as to etch the surface. The bis phenol A-epichlorohydrin epoxy may be brominated. The curing agent may be dicyandiamide. After the swelling treatment the epoxy surface may be either washed in a solvent or air-dried so as to remove the excess swellant from the surface thereof prior to etching. A preferred etchant comprises an aqueous solution of sulphuric acid, and CrO 3 . The etchant may also comprise a surfactant, e.g. a perfluorinated sulphonate. All traces of a deposit on the etched surface may be removed by rinsing with water and treating with a reducing agent for Cr VI ions such as Na 2 SO 3 or alternatively with a basic agent, e.g. NaOH. Materials for deposition on the etched surface may comprise aqueous or organic based paints, lacquers, inks and adhesives, aqueous or non- aqueous solutions of inorganic salts, aqueous or non-aqueous electroless metal deposition solutions, metals applied, e.g. by dipping, brushing, spray-coating, spin-coating, vapour deposition, electroless deposition with or without electrodeposition, sputtering. The product may then be baked, preferably at 110-160‹C for 10-60 minutes. Where an electroless technique is employed, the etched surface is sensitised by depositing or absorbing on the etched surface a sensitiser, e.g. Sn ions, then activated by depositing a catalytic metal, e.g. Pd over the etched surface and then immersed in a standard electroless plating bath, e.g. containing Cu ions. In a preferred embodiment, the etched surface is coated with a photo promoter solution which may be either a positive or a negative type, the photo promoter coated surface selectively exposed to a suitable mass to a source of radiation so that selective regions are formed which are capable of reducing a metal salt, e.g. PdCl 2 , these regions are exposed to the metal salt and the precious metal positive region then exposed to a suitable electroless metal plating bath. In a typical Example a steel plate is coated in a fluidized bed with an epoxy resin mixture obtained by interacting bisphenol A with epichlorohydrin and the coating cured. The coated plate is 1) immersed in methyl ethyl ketone, rinsed with water and 2) etched in a solution of CrO 3 , H 3 PO 4 and H 2 SO 4 , 3) immersed in a sensitizing solution comprising SnCl 4 and SnCl 2 . 2H 2 O, 4) immersed in aqueous PdCl 2 solution, 5) then immersed in an electroless copper plating bath.</p>
申请公布号 GB1384113(A) 申请公布日期 1975.02.19
申请号 GB19720004707 申请日期 1972.02.01
申请人 WESTERN ELECTRIC CO INC 发明人
分类号 C08J7/02;C08J7/14;C23C18/20;C23C18/24;H05K3/38;(IPC1-7):05D5/04;05D7/02 主分类号 C08J7/02
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