首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
SAMASKINE
摘要
申请公布号
DK427875(A)
申请公布日期
1976.03.28
申请号
DK19750004278
申请日期
1975.09.24
申请人
BETTINSON P B & CO LTD
发明人
STOCKS R A
分类号
A01C7/16;A01C15/16;(IPC1-7):A01C/
主分类号
A01C7/16
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Apparatus for Electrically Connecting a Flexible Circuit to a Receiver
ELECTRCIAL CONNECTOR AND ASSEMBLE METHOD OF THE SAME
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
HIGH RESOLUTION PRINTING TECHNIQUE
BALL PLACEMENT IN A PHOTO-PATTERNED TEMPLATE FOR FINE PITCH INTERCONNECT
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
SEMICONDUCTOR-ENCAPSULATING ADHESIVE, SEMICONDUCTOR-ENCAPSULATING FILM-FORM ADHESIVE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
METHOD OF MANUFACTURING SEE-THROUGH THIN FILM SOLAR CELLS
Plasmon Resonance Imaging Apparatus Having Nano-Lycurgus-Cup Arrays and Methods of Use
MICRO-FLUIDIC DEVICE
METHODS AND SYSTEM FOR OBTAINING ALGAL BIOMASS AND CULTIVATION MEDIUM
FC-FUNCTION ASSAY
LYSYL OXIDASE-LIKE 2 ASSAY AND METHODS OF USE THEREOF
Salivary Protein Biomarkers for Human Oral Cancer
MOLECULAR CONJUGATE
GLASS CERAMIC MATERIAL AND METHOD
TWO-PART DENTAL COMPONENT
COMBUSTIBLE FLUID CUTTING SAFETY SYSTEM
THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME
MASK BLANK FOR REFLECTION-TYPE EXPOSURE, AND MASK FOR REFLECTION-TYPE EXPOSURE