| 摘要 |
PROBLEM TO BE SOLVED: To provide a lid heater for a plasma processing chamber to control the temperature of a lid of the processing chamber.SOLUTION: A plasma processing chamber 100 comprises a chamber body 110, a lid 120, a gas panel 138, a controller 140, and a lid heater assembly 190. The lid heater assembly 190 includes a heated ring 189 having a center opening 194, and an insulated center core 193 disposed across the center opening of the heated ring 189. The insulated center core 193 is positioned to control heat loss from the lid 120. The center opening 194 of the heated ring 189 has a diameter D large enough to make the heated ring 189 outside the line-of-sight of the antennas 112. As a result, RF power from the antennas 112 does not intersect with the heated ring 189 to couple with plasma 106.SELECTED DRAWING: Figure 2 |
