EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (EX) for exposing a substrate (P) with an image of a pattern via a projection optical system (PL), the exposure apparatus comprising:a substrate stage (PST) configured to support the substrate and to move the substrate under the projection optical system; and a liquid immersion system which has a supply path (14, 14A, 15) and a recovery path (21, 24) and is configured to supply liquid (1) to a space under the projection optical system via the supply path and to recover the liquid of a liquid immersion region formed in the space via the recovery path, wherein the liquid immersion system comprises a removal portion (17) for removing liquid remaining in the supply path by drawing or discharging the liquid from the supply path.