发明名称 Coating substrate using bernoulli atomic-layer deposition
摘要 A method for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition provides a chamber including a stationary support, through which fluid flows, that supports a moveable substrate. A moveable substrate includes a levitation stabilizing structure on the substrate that defines an enclosed interior impingement area of the substrate. The moveable substrate is positioned proximate to the stationary support so that the stationary support extends beyond the enclosed interior impingement area and the fluid flow is directed within the enclosed interior impingement area of the moveable substrate. A fluid flow, provided from a pressurized-gas source through the stationary support, impinges on the moveable substrate surface within the enclosed interior impingement area to levitate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure to deposit a thin film on the moveable substrate.
申请公布号 US9499906(B2) 申请公布日期 2016.11.22
申请号 US201514621437 申请日期 2015.02.13
申请人 EASTMAN KODAK COMPANY 发明人 Sieber Kurt D.;Ng Kam Chuen;Cok Ronald Steven
分类号 C23C16/455;C23C16/48;C23C16/458 主分类号 C23C16/455
代理机构 代理人 Zimmerli William R.
主权项 1. A method for depositing a thin film on a moveable substrate, comprising: providing a chamber that includes a stationary support through which fluid can flow; providing a moveable substrate that includes a levitation stabilizing structure affixed to the moveable substrate that defines an enclosed interior impingement area of the moveable substrate; positioning the moveable substrate proximate to the stationary support so that the stationary support extends beyond the enclosed interior impingement area and the fluid flow is directed within the enclosed interior impingement area of the moveable substrate; and levitating the moveable substrate by providing a fluid flow from a pressurized-gas source through the stationary support that impinges perpendicularly on the moveable substrate surface within the enclosed interior impingement area of the moveable substrate to expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure to deposit a thin film on the moveable substrate.
地址 Rochester NY US
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