| 摘要 |
A semiconductor memory device consisting of a storage capacitance and an insulated gate field-effect transistor, wherein over a first conductive substance which lies in contact with a source of drain region constituting the transistor and which becomes a gate of the transistor through a first insulating film, a second conductive substance is deposited so that at least a part thereof may be stacked over the first conductive substance, and wherein a second insulating film and a third conductive substance are successively deposited on the second conductive substance, whereby the second conductive substance, the second insulating film and the third conductive substance constitute the storge capacitance.
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