APPARATUS FOR PROCESSING TWO OR MORE SUBSTRATES IN A BATCH PROCESS

摘要

An apparatus for processing two or more substrates in a batch process by subjecting at least part of the surface of the substrates to alternating surface reactions of at least a first and a second precursor. The apparatus includes: multiple substrate holders for supporting the substrates, and a reaction chamber that includes a reaction space for depositing material on the surface of the substrates during a processing phase. The substrate holders are installed or arranged to be installed inside the reaction chamber for processing of the substrates inside the reaction chamber during the processing phase. During a loading phase in which the substrates are loaded to the substrate holders by a loading device, at least some of the substrate holders are arranged to be movable relative to each other.

主权项

1. An apparatus for processing two or more substrates in a batch process by subjecting at least part of a surface of the substrates to alternating surface reactions of at least a first and a second precursor, the apparatus comprising:
multiple substrate holders for supporting said substrates, and a reaction chamber comprising a reaction space, the reaction chamber being configured for depositing material on the surface of the substrates in the reaction space during a processing phase, the substrate holders being installed or arranged to be installed inside the reaction chamber for processing of the substrates inside the reaction chamber during the processing phase,
wherein during a loading phase in which the substrates are loaded to the substrate holders by a loading device, at least some of the substrate holders are arranged to be movable relative to each other.