发明名称 |
Hybrid Phase Unwrapping Systems and Methods for Patterned Wafer Measurement |
摘要 |
Systems and methods for unwrapping phase signals obtained from interferometry measurements of patterned wafer surfaces are disclosed. A phase unwrapping method in accordance with the present disclosure may calculate a front surface phase map and a back surface phase map of a wafer, subtract the back surface phase map from the front surface phase map to obtain a phase difference map, unwrap the phase difference map to obtain a wafer thickness variation map, unwrap the back surface phase map to obtain a back surface map representing the back surface of the wafer; and add the wafer thickness variation map to the back surface phase map to calculate a front surface map representing the front surface of the wafer. |
申请公布号 |
US2016321799(A1) |
申请公布日期 |
2016.11.03 |
申请号 |
US201514808994 |
申请日期 |
2015.07.24 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Chen Haiguang;Sinha Jaydeep |
分类号 |
G06T7/00;G01N21/95;G01N21/88;G01B11/24;G01B11/06 |
主分类号 |
G06T7/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method, comprising:
acquiring at least one image of a front surface of a wafer and at least one image of a back surface of the wafer; calculating a front surface phase map for the wafer based on the at least one image of the front surface of the wafer; calculating a back surface phase map for the wafer based on the at least one image of the back surface of the wafer; subtracting the back surface phase map from the front surface phase map to obtain a phase difference map; phase unwrapping the phase difference map to obtain a wafer thickness variation map; phase unwrapping the back surface phase map to obtain a back surface map representing the back surface of the wafer; and adding the wafer thickness variation map to the back surface phase map to calculate a front surface map representing the front surface of the wafer. |
地址 |
Milpitas CA US |