Photographic light-sensitive antistatic containing material

摘要

A photographic light-sensitive material containing in at least one layer a compound represented by the following formula: Rf-O-CH2CH2O)nCH2CH2-Y wherein Rf represents a perfluoroalkenyl group containing 3 to 12 carbon atoms, n represents an integer 3 to 50, and Y represents a hydroxy group or an organic residue containing 1 to 18 carbon atoms.