发明名称 Method of cleaning liquid discharge head
摘要 A method of cleaning a liquid discharge head having a substrate provided with a supply port, a heat-generating resistor covered with a covering layer, a liquid chamber forming member configured to form a liquid chamber, and at least one electrode and being configured to discharge liquid supplied to the liquid chamber from the supply port by causing the heat-generating resistor to generate heat, includes applying a voltage to the covering layer and the electrode to cause an electrochemical reaction between the covering layer and the liquid and dissolve the covering layer into the liquid to remove kogations accumulated on the covering layer, in which the covering layer and the electrode to which the voltage is to be applied are not provided in the same liquid chamber having the same cross-sectional area in a direction from the covering layer toward the electrode.
申请公布号 US9527290(B2) 申请公布日期 2016.12.27
申请号 US201514789711 申请日期 2015.07.01
申请人 Canon Kabushiki Kaisha 发明人 Yoshinari Norihiro;Ishida Yuzuru;Kato Maki;Misumi Yoshinori;Goto Akio;Matsui Takahiro
分类号 B41J2/14;B41J2/165 主分类号 B41J2/14
代理机构 Canon USA, Inc. IP Division 代理人 Canon USA, Inc. IP Division
主权项 1. A method of cleaning a liquid discharge head, the method comprising: presenting the liquid discharge head having a liquid chamber forming member configured to form a first liquid chamber and a second liquid chamber, a substrate provided with a heat-generating resistor covered with a covering layer provided in the first liquid chamber, and an electrode provided in the second liquid chamber; and applying a voltage between the covering layer and the electrode in case that the covering layer and the electrode communicate with each other through liquid to cause an electrochemical reaction between the covering layer and the liquid and dissolve the covering layer into the liquid to remove kogation accumulated on the covering layer.
地址 Tokyo JP